Impact of spike anneal on ultra shallow junction formation

Impact of spike anneal on ultra shallow junction formation

This report explains the need for ultra shallow junctions for modern day CMOS devices, how spike anneal can help achieve this, reviews the important parameters if this process and how these parameters affect the performances of the CMOS transistors.

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Bibliographic Details
Main Author: Lai, Chung Woh
Other Authors: School of Electrical and Electronic Engineering
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:http://hdl.handle.net/10356/4545
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Institution: Nanyang Technological University
id sg-ntu-dr.10356-4545
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spelling sg-ntu-dr.10356-45452023-07-04T15:08:41Z Impact of spike anneal on ultra shallow junction formation Lai, Chung Woh School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics This report explains the need for ultra shallow junctions for modern day CMOS devices, how spike anneal can help achieve this, reviews the important parameters if this process and how these parameters affect the performances of the CMOS transistors. Master of Science (Microelectronics) 2008-09-17T09:53:54Z 2008-09-17T09:53:54Z 2002 2002 Thesis http://hdl.handle.net/10356/4545 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Lai, Chung Woh
Impact of spike anneal on ultra shallow junction formation
description This report explains the need for ultra shallow junctions for modern day CMOS devices, how spike anneal can help achieve this, reviews the important parameters if this process and how these parameters affect the performances of the CMOS transistors.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Lai, Chung Woh
format Theses and Dissertations
author Lai, Chung Woh
author_sort Lai, Chung Woh
title Impact of spike anneal on ultra shallow junction formation
title_short Impact of spike anneal on ultra shallow junction formation
title_full Impact of spike anneal on ultra shallow junction formation
title_fullStr Impact of spike anneal on ultra shallow junction formation
title_full_unstemmed Impact of spike anneal on ultra shallow junction formation
title_sort impact of spike anneal on ultra shallow junction formation
publishDate 2008
url http://hdl.handle.net/10356/4545
_version_ 1772829148514877440

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