Influence of cleaning process on gate oxide integrity

The influence of cleaning process on GOI (Gate Oxide Integrity) is studied in the whole FEOL (Front End Of the Line) process loop.

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Bibliographic Details
Main Author:	Liu, Qing Guang.
Other Authors:	Prasad, Krishnamachar
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:	http://hdl.handle.net/10356/4740
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Institution:	Nanyang Technological University

Description
Summary:	The influence of cleaning process on GOI (Gate Oxide Integrity) is studied in the whole FEOL (Front End Of the Line) process loop.

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