Influence of cleaning process on gate oxide integrity
The influence of cleaning process on GOI (Gate Oxide Integrity) is studied in the whole FEOL (Front End Of the Line) process loop.
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Online Access: | http://hdl.handle.net/10356/4740 |
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sg-ntu-dr.10356-47402023-07-04T16:00:01Z Influence of cleaning process on gate oxide integrity Liu, Qing Guang. Prasad, Krishnamachar School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics The influence of cleaning process on GOI (Gate Oxide Integrity) is studied in the whole FEOL (Front End Of the Line) process loop. Master of Science (Microelectronics) 2008-09-17T09:57:38Z 2008-09-17T09:57:38Z 2003 2003 Thesis http://hdl.handle.net/10356/4740 Nanyang Technological University application/pdf |
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DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Liu, Qing Guang. Influence of cleaning process on gate oxide integrity |
description |
The influence of cleaning process on GOI (Gate Oxide Integrity) is studied in the whole FEOL (Front End Of the Line) process loop. |
author2 |
Prasad, Krishnamachar |
author_facet |
Prasad, Krishnamachar Liu, Qing Guang. |
format |
Theses and Dissertations |
author |
Liu, Qing Guang. |
author_sort |
Liu, Qing Guang. |
title |
Influence of cleaning process on gate oxide integrity |
title_short |
Influence of cleaning process on gate oxide integrity |
title_full |
Influence of cleaning process on gate oxide integrity |
title_fullStr |
Influence of cleaning process on gate oxide integrity |
title_full_unstemmed |
Influence of cleaning process on gate oxide integrity |
title_sort |
influence of cleaning process on gate oxide integrity |
publishDate |
2008 |
url |
http://hdl.handle.net/10356/4740 |
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1772826886116737024 |