Influence of cleaning process on gate oxide integrity

The influence of cleaning process on GOI (Gate Oxide Integrity) is studied in the whole FEOL (Front End Of the Line) process loop.

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Bibliographic Details
Main Author: Liu, Qing Guang.
Other Authors: Prasad, Krishnamachar
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/4740
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-47402023-07-04T16:00:01Z Influence of cleaning process on gate oxide integrity Liu, Qing Guang. Prasad, Krishnamachar School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics The influence of cleaning process on GOI (Gate Oxide Integrity) is studied in the whole FEOL (Front End Of the Line) process loop. Master of Science (Microelectronics) 2008-09-17T09:57:38Z 2008-09-17T09:57:38Z 2003 2003 Thesis http://hdl.handle.net/10356/4740 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Liu, Qing Guang.
Influence of cleaning process on gate oxide integrity
description The influence of cleaning process on GOI (Gate Oxide Integrity) is studied in the whole FEOL (Front End Of the Line) process loop.
author2 Prasad, Krishnamachar
author_facet Prasad, Krishnamachar
Liu, Qing Guang.
format Theses and Dissertations
author Liu, Qing Guang.
author_sort Liu, Qing Guang.
title Influence of cleaning process on gate oxide integrity
title_short Influence of cleaning process on gate oxide integrity
title_full Influence of cleaning process on gate oxide integrity
title_fullStr Influence of cleaning process on gate oxide integrity
title_full_unstemmed Influence of cleaning process on gate oxide integrity
title_sort influence of cleaning process on gate oxide integrity
publishDate 2008
url http://hdl.handle.net/10356/4740
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