Optimization and application of Epon SU-8, an ultra-thick negative photoresist

• Main Author: Tan, Khee Lip.
• Other Authors: Yang, Lin Jiang
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Manufacturing
• Online Access: http://hdl.handle.net/10356/6465
• Institution: Nanyang Technological University

Another application that requires ultra-thick photoresist films is micromachining in MEMS. Extremely large structure heights are frequently required for micro-electrodeposition of mechanical components such as coils, cantilevers and valves. These applications may require photoresist in excess of a h...