A new unified model for channel thermal noise of deep sub-micron RFCMOS

A new unified model for circuit simulation is presented to predict the high frequency channel thermal noise of deep sub-micron MOSFETs in strong inversion region. Based on the new channel thermal noise model, the simulated channel thermal noise spectral densities of the devices fabricated in a...

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Main Authors: Ong, Shih Ni, Yeo, Kiat Seng, Chan, Lye Hock, Loo, Xi Sung, Boon, Chirn Chye, Do, Manh Anh, Chew, Kok Wai Johnny
Other Authors: School of Electrical and Electronic Engineering
Format: Conference or Workshop Item
Language:English
Published: 2010
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Online Access:https://hdl.handle.net/10356/79246
http://hdl.handle.net/10220/6349
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-792462020-03-07T13:24:43Z A new unified model for channel thermal noise of deep sub-micron RFCMOS Ong, Shih Ni Yeo, Kiat Seng Chan, Lye Hock Loo, Xi Sung Boon, Chirn Chye Do, Manh Anh Chew, Kok Wai Johnny School of Electrical and Electronic Engineering IEEE International Symposium on Radio-Frequency Integration Technology (2009 : Singapore) Chartered Semiconductor Manufacturing Ltd DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits A new unified model for circuit simulation is presented to predict the high frequency channel thermal noise of deep sub-micron MOSFETs in strong inversion region. Based on the new channel thermal noise model, the simulated channel thermal noise spectral densities of the devices fabricated in a 0.13μm RFCMOS technology process are compared to the channel noise directly extracted from RF noise measurements. Published version 2010-08-24T08:36:10Z 2019-12-06T13:20:43Z 2010-08-24T08:36:10Z 2019-12-06T13:20:43Z 2009 2009 Conference Paper Ong, S. N., Yeo, K. S., Chan, L. H., Loo, X. S., Boon, C. C., Do, M. A., et al. (2009). A new unified model for channel thermal noise of deep sub-micron RFCMOS. IEEE International Symposium on Radio-Frequency Integration Technology, Singapore, 280-283. https://hdl.handle.net/10356/79246 http://hdl.handle.net/10220/6349 10.1109/RFIT.2009.5383701 en © 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. http://www.ieee.org/portal/site This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. 4 p. application/pdf
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
Ong, Shih Ni
Yeo, Kiat Seng
Chan, Lye Hock
Loo, Xi Sung
Boon, Chirn Chye
Do, Manh Anh
Chew, Kok Wai Johnny
A new unified model for channel thermal noise of deep sub-micron RFCMOS
description A new unified model for circuit simulation is presented to predict the high frequency channel thermal noise of deep sub-micron MOSFETs in strong inversion region. Based on the new channel thermal noise model, the simulated channel thermal noise spectral densities of the devices fabricated in a 0.13μm RFCMOS technology process are compared to the channel noise directly extracted from RF noise measurements.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Ong, Shih Ni
Yeo, Kiat Seng
Chan, Lye Hock
Loo, Xi Sung
Boon, Chirn Chye
Do, Manh Anh
Chew, Kok Wai Johnny
format Conference or Workshop Item
author Ong, Shih Ni
Yeo, Kiat Seng
Chan, Lye Hock
Loo, Xi Sung
Boon, Chirn Chye
Do, Manh Anh
Chew, Kok Wai Johnny
author_sort Ong, Shih Ni
title A new unified model for channel thermal noise of deep sub-micron RFCMOS
title_short A new unified model for channel thermal noise of deep sub-micron RFCMOS
title_full A new unified model for channel thermal noise of deep sub-micron RFCMOS
title_fullStr A new unified model for channel thermal noise of deep sub-micron RFCMOS
title_full_unstemmed A new unified model for channel thermal noise of deep sub-micron RFCMOS
title_sort new unified model for channel thermal noise of deep sub-micron rfcmos
publishDate 2010
url https://hdl.handle.net/10356/79246
http://hdl.handle.net/10220/6349
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