Applications of atomic layer deposition in solar cells

• Main Authors: Niu, Wenbin, Li, Xianglin, Karuturi, Siva Krishna, Fam, Derrick Wenhui, Fan, Hongjin, Shrestha, Santosh, Wong, Lydia Helena, Tok, Alfred Iing Yoong
• 其他作者: School of Materials Science & Engineering
• 格式: Article
• 語言: English
• 出版: 2016
• 主題: bandstructure engineering; surface passivation
• 在線閱讀: https://hdl.handle.net/10356/82762; http://hdl.handle.net/10220/40275
• 機構: Nanyang Technological University

Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells...