Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference

• Main Authors: Murukeshan, V. M., Sathiyamoorthy, K., Sidharthan Raghuraman.
• Other Authors: School of Mechanical and Aerospace Engineering
• Format: Article
• Language: English
• Published: 2013
• Subjects: DRNTU::Engineering::Mechanical engineering
• Online Access: https://hdl.handle.net/10356/85515; http://hdl.handle.net/10220/13729
• Institution: Nanyang Technological University

In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939.