Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference
In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939.
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| Main Authors: | , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
2013
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/85515 http://hdl.handle.net/10220/13729 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939. |
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