Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference

In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939.

Saved in:

Bibliographic Details
Main Authors:	Murukeshan, V. M., Sathiyamoorthy, K., Sidharthan Raghuraman.
Other Authors:	School of Mechanical and Aerospace Engineering
Format:	Article
Language:	English
Published:	2013
Subjects:	DRNTU::Engineering::Mechanical engineering
Online Access:	https://hdl.handle.net/10356/85515 http://hdl.handle.net/10220/13729
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	Nanyang Technological University
Language:	English

id	sg-ntu-dr.10356-85515
record_format	dspace
spelling	sg-ntu-dr.10356-855152020-03-07T13:19:24Z Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference Murukeshan, V. M. Sathiyamoorthy, K. Sidharthan Raghuraman. School of Mechanical and Aerospace Engineering DRNTU::Engineering::Mechanical engineering In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939. 2013-09-30T05:59:20Z 2019-12-06T16:05:16Z 2013-09-30T05:59:20Z 2019-12-06T16:05:16Z 2012 2012 Journal Article Sidharthan, R., Murukeshan, V. M., & Sathiyamoorthy, K. (2012). Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference. Journal of nanoscience and nanotechnology, 12(8), 6428-6431. https://hdl.handle.net/10356/85515 http://hdl.handle.net/10220/13729 10.1166/jnn.2012.6453 en Journal of nanoscience and nanotechnology
institution	Nanyang Technological University
building	NTU Library
country	Singapore
collection	DR-NTU
language	English
topic	DRNTU::Engineering::Mechanical engineering
spellingShingle	DRNTU::Engineering::Mechanical engineering Murukeshan, V. M. Sathiyamoorthy, K. Sidharthan Raghuraman. Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference
description	In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939.
author2	School of Mechanical and Aerospace Engineering
author_facet	School of Mechanical and Aerospace Engineering Murukeshan, V. M. Sathiyamoorthy, K. Sidharthan Raghuraman.
format	Article
author	Murukeshan, V. M. Sathiyamoorthy, K. Sidharthan Raghuraman.
author_sort	Murukeshan, V. M.
title	Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference
title_short	Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference
title_full	Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference
title_fullStr	Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference
title_full_unstemmed	Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference
title_sort	sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference
publishDate	2013
url	https://hdl.handle.net/10356/85515 http://hdl.handle.net/10220/13729
_version_	1681044495860236288

Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference

Similar Items