Periodic feature patterning by lens based solid immersion multiple beam laser interference lithography
In this paper, we report a novel concept and methodology to fabricate high resolution periodic features using i-line laser source and multiple converging lenses. This configuration reduces the number of optical elements by employing a converging two-lens system to direct the beams on to the sample i...
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| Main Authors: | , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/85691 http://hdl.handle.net/10220/16599 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | In this paper, we report a novel concept and methodology to fabricate high resolution periodic features using i-line laser source and multiple converging lenses. This configuration reduces the number of optical elements by employing a converging two-lens system to direct the beams on to the sample instead of conventional multiple mirror assembly that is normally associated with multiple beam interference configurations. A simple optical configuration using a 60° prism, 364 nm laser source and two converging lenses are employed to implement immersion lithography concept to achieve four beam interference. Square lattice patterns with pitch size of 210±8 and 240±6 nm are recorded on a positive photo resist using this technique. |
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