Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE
Recently, AlGaN/GaN HEMTs grown on 100 mm diameter Si using plasma assisted molecular beam epitaxy (PA-MBE) have been demonstrated [1,2]. In these structures, the growth rate is limited by the active nitrogen species available from the nitrogen plasma. Co...
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sg-ntu-dr.10356-922212019-12-06T18:19:31Z Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE Agrawal, M. Radhakrishnan, K. Sun, Z. Z. Dharmarasu, Nethaji School of Electrical and Electronic Engineering International Conference on Nitride Semiconductors (9th : 2011 : Glasgow, Scotland, UK) DRNTU::Engineering::Electrical and electronic engineering::Semiconductors Recently, AlGaN/GaN HEMTs grown on 100 mm diameter Si using plasma assisted molecular beam epitaxy (PA-MBE) have been demonstrated [1,2]. In these structures, the growth rate is limited by the active nitrogen species available from the nitrogen plasma. Consequently, longer growth times are required to achieve thicker buffer layer necessary for the device structures. However, the narrow growth widow for the GaN layer in PA-MBE technique is affected by the fluctuation in substrate temperature and material fluxes during the long growth period. Accepted version 2011-09-16T01:02:09Z 2019-12-06T18:19:31Z 2011-09-16T01:02:09Z 2019-12-06T18:19:31Z 2011 2011 Conference Paper Dharmarasu, N., Agrawal, M., Radhakrishnan, K., & Sun, Z. Z. (2011). Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE. Paper presented at the 9th International Conference on Nitride Semiconductors. https://hdl.handle.net/10356/92221 http://hdl.handle.net/10220/7079 159550 en © 2011 9th International Conference on Nitride Semiconductors. This is the author created version of a work that has been peer reviewed and accepted for publication by 9th International Conference on Nitride Semiconductors. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The official conference website is: http://www.icns9.org/. 1 p. application/pdf |
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DRNTU::Engineering::Electrical and electronic engineering::Semiconductors Agrawal, M. Radhakrishnan, K. Sun, Z. Z. Dharmarasu, Nethaji Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE |
description |
Recently, AlGaN/GaN HEMTs grown on 100 mm diameter Si using plasma assisted
molecular beam epitaxy (PA-MBE) have been demonstrated [1,2]. In these structures, the
growth rate is limited by the active nitrogen species available from the nitrogen plasma.
Consequently, longer growth times are required to achieve thicker buffer layer necessary for
the device structures. However, the narrow growth widow for the GaN layer in PA-MBE
technique is affected by the fluctuation in substrate temperature and material fluxes during
the long growth period. |
author2 |
School of Electrical and Electronic Engineering |
author_facet |
School of Electrical and Electronic Engineering Agrawal, M. Radhakrishnan, K. Sun, Z. Z. Dharmarasu, Nethaji |
format |
Conference or Workshop Item |
author |
Agrawal, M. Radhakrishnan, K. Sun, Z. Z. Dharmarasu, Nethaji |
author_sort |
Agrawal, M. |
title |
Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE |
title_short |
Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE |
title_full |
Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE |
title_fullStr |
Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE |
title_full_unstemmed |
Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE |
title_sort |
ga-bilayer controlled algan/gan hemt structure grown on si by pa-mbe |
publishDate |
2011 |
url |
https://hdl.handle.net/10356/92221 http://hdl.handle.net/10220/7079 |
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1681048216710152192 |