Low-temperature crystallized pyrochlore bismuth zinc niobate thin films by excimer laser annealing

The crystallization temperature of Bi1.5Zn0.5Nb1.5O6.5 (BZN) films was reduced by a combination of conventional heating and irradiation with a pulsed KrF excimer laser. Both the energy density and substrate temperature affect the properties of laser-annealed BZN films. It was found tha...

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Main Authors: Cheng, Jian Gong, Wang, Junling, Dechakupt, Tanawadee, Trolier-McKinstry, Susan
其他作者: School of Materials Science & Engineering
格式: Article
語言:English
出版: 2011
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在線閱讀:https://hdl.handle.net/10356/93933
http://hdl.handle.net/10220/6913
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機構: Nanyang Technological University
語言: English
實物特徵
總結:The crystallization temperature of Bi1.5Zn0.5Nb1.5O6.5 (BZN) films was reduced by a combination of conventional heating and irradiation with a pulsed KrF excimer laser. Both the energy density and substrate temperature affect the properties of laser-annealed BZN films. It was found that the crystallinity and dielectric properties improved after a postannealing at 400 °C for 2 h in an oxygen atmosphere. BZN films crystallized with an energy density of 27 mJ/cm2 at a substrate temperature of 400 °C with postannealing showed dielectric properties comparable to those of rapid thermal annealed BZN films. Laser crystallization at substrate temperatures 400 °C makes integration with polymeric substrates possible.