Low-temperature crystallized pyrochlore bismuth zinc niobate thin films by excimer laser annealing
The crystallization temperature of Bi1.5Zn0.5Nb1.5O6.5 (BZN) films was reduced by a combination of conventional heating and irradiation with a pulsed KrF excimer laser. Both the energy density and substrate temperature affect the properties of laser-annealed BZN films. It was found tha...
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Main Authors: | , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
2011
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/93933 http://hdl.handle.net/10220/6913 |
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Institution: | Nanyang Technological University |
Language: | English |
Summary: | The crystallization temperature of Bi1.5Zn0.5Nb1.5O6.5 (BZN) films was reduced by a combination of
conventional heating and irradiation with a pulsed KrF excimer laser. Both the energy density and
substrate temperature affect the properties of laser-annealed BZN films. It was found that the
crystallinity and dielectric properties improved after a postannealing at 400 °C for 2 h in an oxygen
atmosphere. BZN films crystallized with an energy density of 27 mJ/cm2 at a substrate temperature
of 400 °C with postannealing showed dielectric properties comparable to those of rapid thermal
annealed BZN films. Laser crystallization at substrate temperatures 400 °C makes integration
with polymeric substrates possible. |
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