Fracture toughness measurement of thin films on compliant substrate using controlled buckling test

• Main Authors: Chen, Zhong, Gan, Zhenghao
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• Online Access: https://hdl.handle.net/10356/94153; http://hdl.handle.net/10220/8202
• Institution: Nanyang Technological University

Thin films and multilayered structures are increasingly used in the industry. One of the important mechanical properties of these thin layers is the fracture toughness, which may be quite different from the known value of the bulk sample due to microstructural difference. In the design towards device flexibility and scratch resistance, for example, fracture toughness is an important parameter of consideration. This work presents a testing scheme using controlled buckling experiment to determine the fracture toughness of brittle thin films prepared on compliant substrates. When the film is under tension, steady-state channelling cracks form in parallel to each other. Critical fracture strain can be calculated by the measuring the displacement of the buckled plate. The fracture toughness can then be obtained with the help of finite element calculation. When the substrate experiences plastic deformation, the energy release rate is increased by the degree of plasticity. Fracture toughness measurement of two types of thin film Cu–Sn intermetallic compounds has been given to illustrate the merits of such a test scheme.