Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography

The fabrication of arrays of sub-50-nm gold dots and line structures with deliberately designed 12−100-nm gaps is reported. These structures were made by initially using dip-pen nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid, on Au/Ti/SiOx/Si substrates and then using wet-c...

Full description

Saved in:
Bibliographic Details
Main Authors: Mirkin, Chad A., Zhang, Hua, Chung, Sung-Wook
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
Subjects:
Online Access:https://hdl.handle.net/10356/95377
http://hdl.handle.net/10220/8574
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English

Similar Items