Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography
The fabrication of arrays of sub-50-nm gold dots and line structures with deliberately designed 12−100-nm gaps is reported. These structures were made by initially using dip-pen nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid, on Au/Ti/SiOx/Si substrates and then using wet-c...
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Main Authors: | Mirkin, Chad A., Zhang, Hua, Chung, Sung-Wook |
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Other Authors: | School of Materials Science & Engineering |
Format: | Article |
Language: | English |
Published: |
2012
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/95377 http://hdl.handle.net/10220/8574 |
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Institution: | Nanyang Technological University |
Language: | English |
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