Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications

We report a triggering voltage Vtrig for observing gate leakage current (Ig) random telegraph noise (RTN) in the post-breakdown regime of HfLaO dielectric metal gate stacks. Vtrig, the onset voltage to observe RTN in degraded dielectrics, is highly dependent on breakdown hardness, which is controlle...

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Main Authors: Liu, W. H., Pey, Kin Leong, Raghavan, Nagarajan, Wu, X., Bosman, Michel
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2013
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Online Access:https://hdl.handle.net/10356/96328
http://hdl.handle.net/10220/10027
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-963282020-03-07T14:02:46Z Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications Liu, W. H. Pey, Kin Leong Raghavan, Nagarajan Wu, X. Bosman, Michel School of Electrical and Electronic Engineering Microelectronics Centre DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio We report a triggering voltage Vtrig for observing gate leakage current (Ig) random telegraph noise (RTN) in the post-breakdown regime of HfLaO dielectric metal gate stacks. Vtrig, the onset voltage to observe RTN in degraded dielectrics, is highly dependent on breakdown hardness, which is controlled by the leakage current compliance (Igl). This dependence is qualitatively analyzed using a percolation dilation model, where generation of additional traps either at different energy levels or spatial locations gives lower Vtrig at higher Igl. The magnitude of Vtrig can be used as a direct indication of the impact of RTN on the performance of the transistor at device level, when Vtrig is evaluated by comparing with the device operating voltage. Published version 2013-05-30T08:18:30Z 2019-12-06T19:29:03Z 2013-05-30T08:18:30Z 2019-12-06T19:29:03Z 2012 2012 Journal Article Liu, W. H., Pey, K. L., Raghavan, N., Wu, X., & Bosman, M. (2012). Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications. Journal of applied physics, 111(2). 0021-8979 https://hdl.handle.net/10356/96328 http://hdl.handle.net/10220/10027 10.1063/1.3676255 en Journal of applied physics © 2012 American Institute of Physics. This paper was published in Journal of Applied Physics and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official DOI: [http://dx.doi.org/10.1063/1.3676255].  One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. application/pdf
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio
Liu, W. H.
Pey, Kin Leong
Raghavan, Nagarajan
Wu, X.
Bosman, Michel
Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications
description We report a triggering voltage Vtrig for observing gate leakage current (Ig) random telegraph noise (RTN) in the post-breakdown regime of HfLaO dielectric metal gate stacks. Vtrig, the onset voltage to observe RTN in degraded dielectrics, is highly dependent on breakdown hardness, which is controlled by the leakage current compliance (Igl). This dependence is qualitatively analyzed using a percolation dilation model, where generation of additional traps either at different energy levels or spatial locations gives lower Vtrig at higher Igl. The magnitude of Vtrig can be used as a direct indication of the impact of RTN on the performance of the transistor at device level, when Vtrig is evaluated by comparing with the device operating voltage.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Liu, W. H.
Pey, Kin Leong
Raghavan, Nagarajan
Wu, X.
Bosman, Michel
format Article
author Liu, W. H.
Pey, Kin Leong
Raghavan, Nagarajan
Wu, X.
Bosman, Michel
author_sort Liu, W. H.
title Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications
title_short Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications
title_full Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications
title_fullStr Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications
title_full_unstemmed Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications
title_sort triggering voltage for post-breakdown random telegraph noise in hflao dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications
publishDate 2013
url https://hdl.handle.net/10356/96328
http://hdl.handle.net/10220/10027
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