Study of copper diffusion into tantalum and tantalum diffusion into copper

International Journal of Modern Physics B

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Bibliographic Details
Main Authors: Loh, S.W., Zhang, D.H., Li, C.Y., Liu, R., Wee, A.T.S.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113118
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Institution: National University of Singapore