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Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing
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by Zhang, D.H., Loh, S.W., Li, C.Y., Foo, P.D., Xie, J., Liu, R., Wee, A.T.S., Zhang, L., Lee, Y.K.
Published 2014
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by Yang, J, Acosta, C.J, Si, G.-A, Zeng, J, Li, C.-Y, Liang, D, Ochiai, R.L, Page, A.-L, Danovaro-Holliday, M.C, Zhang, J, Zhou, B.-D, Liao, H.-Z, Wang, M.-L, Tan, D.-M, Tang, Z.-Z, Gong, J, Park, J.-K, Ali, M, Ivanoff, B, Liang, G.-C, Yang, H.-H, Pang, T, Xu, Z.-Y, Donner, A, Galindo, C.M, Dong, B.-Q, Clemens, J.D
Published 2020
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