CMOS compatible dual metal gate integration with successful vth adjustment on high-k HfTaON by high-temperature metal intermixing

• Main Authors: Ren, C., Chan, D.S.H., Loh, W.Y., Peng, J.W., Balakumar, S., Jiang, Y., Tung, C.H., Du, A.Y., Lo, G.Q., Kumar, R., Balasubramanian, N., Kwong, D.-L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/114547
• Institution: National University of Singapore

10.1109/ESSDER.2006.307661