Device reliability and failure mechanisms related to gate dielectrics and interconnects

Proceedings of the IEEE International Conference on VLSI Design

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Bibliographic Details
Main Author: Radhakrishnan, M.K.
Other Authors: INSTITUTE OF MICROELECTRONICS
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/116064
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Institution: National University of Singapore
Description
Summary:Proceedings of the IEEE International Conference on VLSI Design