The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition

The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition

10.1063/1.4798928

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Bibliographic Details
Main Authors: Wong, J., Yeghikyan, D., Kherani, N.P.
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Conference or Workshop Item
Published: 2016
Online Access:http://scholarbank.nus.edu.sg/handle/10635/128760
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Institution: National University of Singapore
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Summary:10.1063/1.4798928

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