The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition

10.1063/1.4798928

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Main Authors: Wong, J., Yeghikyan, D., Kherani, N.P.
其他作者: SOLAR ENERGY RESEARCH INST OF S'PORE
格式: Conference or Workshop Item
出版: 2016
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/128760
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機構: National University of Singapore
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spelling sg-nus-scholar.10635-1287602024-11-11T12:13:40Z The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition Wong, J. Yeghikyan, D. Kherani, N.P. SOLAR ENERGY RESEARCH INST OF S'PORE 10.1063/1.4798928 Journal of Applied Physics 113 13 - JAPIA 2016-10-19T08:44:51Z 2016-10-19T08:44:51Z 2013-04-07 Conference Paper Wong, J., Yeghikyan, D., Kherani, N.P. (2013-04-07). The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition. Journal of Applied Physics 113 (13) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4798928 00218979 http://scholarbank.nus.edu.sg/handle/10635/128760 000317238000005 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.4798928
author2 SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet SOLAR ENERGY RESEARCH INST OF S'PORE
Wong, J.
Yeghikyan, D.
Kherani, N.P.
format Conference or Workshop Item
author Wong, J.
Yeghikyan, D.
Kherani, N.P.
spellingShingle Wong, J.
Yeghikyan, D.
Kherani, N.P.
The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition
author_sort Wong, J.
title The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition
title_short The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition
title_full The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition
title_fullStr The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition
title_full_unstemmed The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition
title_sort augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition
publishDate 2016
url http://scholarbank.nus.edu.sg/handle/10635/128760
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