Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices

Proceedings of SPIE - The International Society for Optical Engineering

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Main Authors: Lahiri, S.K., Lim, C.W., Chan, L.
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2016
Online Access:http://scholarbank.nus.edu.sg/handle/10635/134142
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1341422017-01-01T14:54:36Z Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices Lahiri, S.K. Lim, C.W. Chan, L. ELECTRICAL ENGINEERING Proceedings of SPIE - The International Society for Optical Engineering 3316 2 957-966 PSISD 2016-12-20T08:43:56Z 2016-12-20T08:43:56Z 1998 Conference Paper Lahiri, S.K., Lim, C.W., Chan, L. (1998). Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices. Proceedings of SPIE - The International Society for Optical Engineering 3316 (2) : 957-966. ScholarBank@NUS Repository. 0277786X http://scholarbank.nus.edu.sg/handle/10635/134142 NOT_IN_WOS
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Proceedings of SPIE - The International Society for Optical Engineering
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Lahiri, S.K.
Lim, C.W.
Chan, L.
format Conference or Workshop Item
author Lahiri, S.K.
Lim, C.W.
Chan, L.
spellingShingle Lahiri, S.K.
Lim, C.W.
Chan, L.
Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices
author_sort Lahiri, S.K.
title Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices
title_short Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices
title_full Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices
title_fullStr Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices
title_full_unstemmed Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices
title_sort titanium self-aligned silicide process fabrication issues for deep sub-micron cmos devices
publishDate 2016
url http://scholarbank.nus.edu.sg/handle/10635/134142
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