Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices
Proceedings of SPIE - The International Society for Optical Engineering
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sg-nus-scholar.10635-1341422017-01-01T14:54:36Z Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices Lahiri, S.K. Lim, C.W. Chan, L. ELECTRICAL ENGINEERING Proceedings of SPIE - The International Society for Optical Engineering 3316 2 957-966 PSISD 2016-12-20T08:43:56Z 2016-12-20T08:43:56Z 1998 Conference Paper Lahiri, S.K., Lim, C.W., Chan, L. (1998). Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices. Proceedings of SPIE - The International Society for Optical Engineering 3316 (2) : 957-966. ScholarBank@NUS Repository. 0277786X http://scholarbank.nus.edu.sg/handle/10635/134142 NOT_IN_WOS |
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Proceedings of SPIE - The International Society for Optical Engineering |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Lahiri, S.K. Lim, C.W. Chan, L. |
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Conference or Workshop Item |
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Lahiri, S.K. Lim, C.W. Chan, L. |
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Lahiri, S.K. Lim, C.W. Chan, L. Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices |
author_sort |
Lahiri, S.K. |
title |
Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices |
title_short |
Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices |
title_full |
Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices |
title_fullStr |
Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices |
title_full_unstemmed |
Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices |
title_sort |
titanium self-aligned silicide process fabrication issues for deep sub-micron cmos devices |
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2016 |
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http://scholarbank.nus.edu.sg/handle/10635/134142 |
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