Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices

Titanium self-aligned silicide process fabrication issues for deep sub-micron CMOS devices

Proceedings of SPIE - The International Society for Optical Engineering

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Bibliographic Details
Main Authors: Lahiri, S.K., Lim, C.W., Chan, L.
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2016
Online Access:http://scholarbank.nus.edu.sg/handle/10635/134142
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Institution: National University of Singapore
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