Effects of Cu:Al ratios and SiO2 substrates on PE-MOCVD copper aluminium oxide semiconductor thin films
Master's
Saved in:
Main Author: | CAI JIANLING |
---|---|
Other Authors: | MATERIALS SCIENCE |
Format: | Theses and Dissertations |
Language: | English |
Published: |
2010
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/14088 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Language: | English |
Similar Items
-
P-type transparent conducting CU-AL-O thin films prepared by PE-MOCVD
by: WANG YUE
Published: (2011) -
Effects of aluminum on the properties of p-type Cu-Al-O transparent oxide semiconductor prepared by reactive co-sputtering
by: Ong, C.H., et al.
Published: (2014) -
Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition
by: Wang, Y., et al.
Published: (2014) -
The Manufacturing Of Cu-Al2O3 Composite Products: Study Of Process Parameters, Structure And Mechanical Properties
by: Sergei, Sapozhnikov, et al.
Published: (2016) -
Comparative studies of manganese-doped copper-based catalysts: The promoter effect of Mn on methanol synthesis
by: Chen, H.Y., et al.
Published: (2014)