Should the refractive index at 633 nm Be used to characterize silicon nitride films?

Should the refractive index at 633 nm Be used to characterize silicon nitride films?

10.1109/PVSC.2017.8366682

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Bibliographic Details
Main Authors: Hameiri, Z, Borojevic, N, Mai, L, Nandakumar, N, Kim, K, Winderbaum, S
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Conference or Workshop Item
Published: IEEE 2019
Online Access:https://scholarbank.nus.edu.sg/handle/10635/155053
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1550532019-06-06T09:05:25Z Should the refractive index at 633 nm Be used to characterize silicon nitride films? Hameiri, Z Borojevic, N Mai, L Nandakumar, N Kim, K Winderbaum, S SOLAR ENERGY RESEARCH INST OF S'PORE 10.1109/PVSC.2017.8366682 2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017 1-5 2019-06-03T04:38:45Z 2019-06-03T04:38:45Z 2017-01-01 2019-06-03T01:43:16Z Conference Paper Hameiri, Z, Borojevic, N, Mai, L, Nandakumar, N, Kim, K, Winderbaum, S (2017-01-01). Should the refractive index at 633 nm Be used to characterize silicon nitride films?. 2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017 : 1-5. ScholarBank@NUS Repository. https://doi.org/10.1109/PVSC.2017.8366682 9781509056057 https://scholarbank.nus.edu.sg/handle/10635/155053 IEEE Elements
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 10.1109/PVSC.2017.8366682
author2 SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet SOLAR ENERGY RESEARCH INST OF S'PORE
Hameiri, Z
Borojevic, N
Mai, L
Nandakumar, N
Kim, K
Winderbaum, S
format Conference or Workshop Item
author Hameiri, Z
Borojevic, N
Mai, L
Nandakumar, N
Kim, K
Winderbaum, S
spellingShingle Hameiri, Z
Borojevic, N
Mai, L
Nandakumar, N
Kim, K
Winderbaum, S
Should the refractive index at 633 nm Be used to characterize silicon nitride films?
author_sort Hameiri, Z
title Should the refractive index at 633 nm Be used to characterize silicon nitride films?
title_short Should the refractive index at 633 nm Be used to characterize silicon nitride films?
title_full Should the refractive index at 633 nm Be used to characterize silicon nitride films?
title_fullStr Should the refractive index at 633 nm Be used to characterize silicon nitride films?
title_full_unstemmed Should the refractive index at 633 nm Be used to characterize silicon nitride films?
title_sort should the refractive index at 633 nm be used to characterize silicon nitride films?
publisher IEEE
publishDate 2019
url https://scholarbank.nus.edu.sg/handle/10635/155053
_version_ 1681099455474958336

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