Should the refractive index at 633 nm Be used to characterize silicon nitride films?

• Main Authors: Hameiri, Z, Borojevic, N, Mai, L, Nandakumar, N, Kim, K, Winderbaum, S
• Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
• Format: Conference or Workshop Item
• Published: IEEE 2019
• Online Access: https://scholarbank.nus.edu.sg/handle/10635/155053
• Institution: National University of Singapore

10.1109/PVSC.2017.8366682