Ferroelectric HfO2-based materials for next-generation ferroelectric memories

10.1142/S2010135X16300036

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Bibliographic Details
Main Authors: Fan, Z, Chen, J, Wang, J
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Review
Published: World Scientific Publishing Co. Pte Ltd 2020
Online Access:https://scholarbank.nus.edu.sg/handle/10635/174958
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1749582024-04-17T02:44:25Z Ferroelectric HfO2-based materials for next-generation ferroelectric memories Fan, Z Chen, J Wang, J MATERIALS SCIENCE AND ENGINEERING 10.1142/S2010135X16300036 Journal of Advanced Dielectrics 6 2 1630003 2020-09-09T01:33:09Z 2020-09-09T01:33:09Z 2016 Review Fan, Z, Chen, J, Wang, J (2016). Ferroelectric HfO2-based materials for next-generation ferroelectric memories. Journal of Advanced Dielectrics 6 (2) : 1630003. ScholarBank@NUS Repository. https://doi.org/10.1142/S2010135X16300036 2010135X https://scholarbank.nus.edu.sg/handle/10635/174958 World Scientific Publishing Co. Pte Ltd Unpaywall 20200831
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1142/S2010135X16300036
author2 MATERIALS SCIENCE AND ENGINEERING
author_facet MATERIALS SCIENCE AND ENGINEERING
Fan, Z
Chen, J
Wang, J
format Review
author Fan, Z
Chen, J
Wang, J
spellingShingle Fan, Z
Chen, J
Wang, J
Ferroelectric HfO2-based materials for next-generation ferroelectric memories
author_sort Fan, Z
title Ferroelectric HfO2-based materials for next-generation ferroelectric memories
title_short Ferroelectric HfO2-based materials for next-generation ferroelectric memories
title_full Ferroelectric HfO2-based materials for next-generation ferroelectric memories
title_fullStr Ferroelectric HfO2-based materials for next-generation ferroelectric memories
title_full_unstemmed Ferroelectric HfO2-based materials for next-generation ferroelectric memories
title_sort ferroelectric hfo2-based materials for next-generation ferroelectric memories
publisher World Scientific Publishing Co. Pte Ltd
publishDate 2020
url https://scholarbank.nus.edu.sg/handle/10635/174958
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