Ferroelectric HfO2-based materials for next-generation ferroelectric memories
10.1142/S2010135X16300036
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| Main Authors: | , , |
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| Other Authors: | |
| Format: | Review |
| Published: |
World Scientific Publishing Co. Pte Ltd
2020
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| Online Access: | https://scholarbank.nus.edu.sg/handle/10635/174958 |
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| Institution: | National University of Singapore |