High-K MOSFETS with high mobility channels

Ph.D

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Bibliographic Details
Main Author:	HUANG JIDONG
Other Authors:	MECHANICAL ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	high-k dielectrics, SiGe, MOSFETs, surface treatment, laser anneal
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/17601
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-17601
record_format	dspace
spelling	sg-nus-scholar.10635-176012015-01-06T13:31:53Z High-K MOSFETS with high mobility channels HUANG JIDONG MECHANICAL ENGINEERING TAY AH ONG, ANDREW ZHU CHUNXIANG high-k dielectrics, SiGe, MOSFETs, surface treatment, laser anneal Ph.D DOCTOR OF PHILOSOPHY 2010-07-13T18:01:40Z 2010-07-13T18:01:40Z 2007-09-20 Thesis HUANG JIDONG (2007-09-20). High-K MOSFETS with high mobility channels. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/17601 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	high-k dielectrics, SiGe, MOSFETs, surface treatment, laser anneal
spellingShingle	high-k dielectrics, SiGe, MOSFETs, surface treatment, laser anneal HUANG JIDONG High-K MOSFETS with high mobility channels
description	Ph.D
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING HUANG JIDONG
format	Theses and Dissertations
author	HUANG JIDONG
author_sort	HUANG JIDONG
title	High-K MOSFETS with high mobility channels
title_short	High-K MOSFETS with high mobility channels
title_full	High-K MOSFETS with high mobility channels
title_fullStr	High-K MOSFETS with high mobility channels
title_full_unstemmed	High-K MOSFETS with high mobility channels
title_sort	high-k mosfets with high mobility channels
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/17601
_version_	1681079500696190976

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