High-K MOSFETS with high mobility channels

High-K MOSFETS with high mobility channels

Ph.D

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Bibliographic Details
Main Author:	HUANG JIDONG
Other Authors:	MECHANICAL ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	high-k dielectrics, SiGe, MOSFETs, surface treatment, laser anneal
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/17601
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Institution:	National University of Singapore
Language:	English

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