THE INFLUENCE OF A LAYER OF OXIDE ON ELECTROMIGRATION PERFORMANCE OF AL/CU/SI METAL LINES

Master's

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Bibliographic Details
Main Author: DAVID KOH KHAR ANN
Other Authors: ELECTRICAL ENGINEERING
Format: Theses and Dissertations
Published: 2020
Online Access:https://scholarbank.nus.edu.sg/handle/10635/182158
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Institution: National University of Singapore