THE INFLUENCE OF A LAYER OF OXIDE ON ELECTROMIGRATION PERFORMANCE OF AL/CU/SI METAL LINES
Master's
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Main Author: | DAVID KOH KHAR ANN |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Theses and Dissertations |
Published: |
2020
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Online Access: | https://scholarbank.nus.edu.sg/handle/10635/182158 |
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Institution: | National University of Singapore |
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