Process flow for a performance enhanced MOSFET with self-aligned, recessed channel
US7091092
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sg-nus-scholar.10635-327182024-11-13T12:47:04Z Process flow for a performance enhanced MOSFET with self-aligned, recessed channel SNEELAL, SNEEDHARAN PILLAI POH, FRANCIS LEE, JAMES SEE, ALEX LAU, C. K. SAMUDRA, GANESH SHANKAR ELECTRICAL & COMPUTER ENGINEERING PHYSICS CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SINGAPORE, SG) NATIONAL UNIVERSITY OF SINGAPORE US7091092 Granted Patent 2012-05-02T02:29:20Z 2012-05-02T02:29:20Z 2006-08-15 Patent SNEELAL, SNEEDHARAN PILLAI,POH, FRANCIS,LEE, JAMES,SEE, ALEX,LAU, C. K.,SAMUDRA, GANESH SHANKAR (2006-08-15). Process flow for a performance enhanced MOSFET with self-aligned, recessed channel. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/32718 NOT_IN_WOS PatSnap |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING SNEELAL, SNEEDHARAN PILLAI POH, FRANCIS LEE, JAMES SEE, ALEX LAU, C. K. SAMUDRA, GANESH SHANKAR |
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SNEELAL, SNEEDHARAN PILLAI POH, FRANCIS LEE, JAMES SEE, ALEX LAU, C. K. SAMUDRA, GANESH SHANKAR |
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SNEELAL, SNEEDHARAN PILLAI POH, FRANCIS LEE, JAMES SEE, ALEX LAU, C. K. SAMUDRA, GANESH SHANKAR Process flow for a performance enhanced MOSFET with self-aligned, recessed channel |
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SNEELAL, SNEEDHARAN PILLAI |
title |
Process flow for a performance enhanced MOSFET with self-aligned, recessed channel |
title_short |
Process flow for a performance enhanced MOSFET with self-aligned, recessed channel |
title_full |
Process flow for a performance enhanced MOSFET with self-aligned, recessed channel |
title_fullStr |
Process flow for a performance enhanced MOSFET with self-aligned, recessed channel |
title_full_unstemmed |
Process flow for a performance enhanced MOSFET with self-aligned, recessed channel |
title_sort |
process flow for a performance enhanced mosfet with self-aligned, recessed channel |
publishDate |
2012 |
url |
http://scholarbank.nus.edu.sg/handle/10635/32718 |
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