Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon

Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon

10.1063/1.1491278

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Bibliographic Details
Main Authors: Chong, Y.F., Pey, K.L., Wee, A.T.S., Osipowicz, T., See, A., Chan, L.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55415
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Institution: National University of Singapore
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Summary:10.1063/1.1491278

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