Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon

10.1063/1.1491278

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Main Authors:	Chong, Y.F., Pey, K.L., Wee, A.T.S., Osipowicz, T., See, A., Chan, L.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/55415
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-554152023-10-25T23:10:28Z Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon Chong, Y.F. Pey, K.L. Wee, A.T.S. Osipowicz, T. See, A. Chan, L. PHYSICS ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1491278 Journal of Applied Physics 92 3 1344-1350 JAPIA 2014-06-17T02:42:48Z 2014-06-17T02:42:48Z 2002-08-01 Article Chong, Y.F., Pey, K.L., Wee, A.T.S., Osipowicz, T., See, A., Chan, L. (2002-08-01). Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon. Journal of Applied Physics 92 (3) : 1344-1350. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1491278 00218979 http://scholarbank.nus.edu.sg/handle/10635/55415 000176907700027 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.1491278
author2	PHYSICS
author_facet	PHYSICS Chong, Y.F. Pey, K.L. Wee, A.T.S. Osipowicz, T. See, A. Chan, L.
format	Article
author	Chong, Y.F. Pey, K.L. Wee, A.T.S. Osipowicz, T. See, A. Chan, L.
spellingShingle	Chong, Y.F. Pey, K.L. Wee, A.T.S. Osipowicz, T. See, A. Chan, L. Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon
author_sort	Chong, Y.F.
title	Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon
title_short	Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon
title_full	Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon
title_fullStr	Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon
title_full_unstemmed	Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon
title_sort	control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/55415
_version_	1781412125291315200

Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon

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