Correlation between interface traps and gate oxide leakage current in the direct tunneling regime

10.1063/1.1492011

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Bibliographic Details
Main Authors: Loh, W.Y., Cho, B.J., Li, M.F.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55453
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Institution: National University of Singapore