Correlation between interface traps and gate oxide leakage current in the direct tunneling regime
10.1063/1.1492011
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Main Authors: | Loh, W.Y., Cho, B.J., Li, M.F. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/55453 |
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Institution: | National University of Singapore |
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