Correlation between interface traps and gate oxide leakage current in the direct tunneling regime
10.1063/1.1492011
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sg-nus-scholar.10635-554532023-10-25T23:11:41Z Correlation between interface traps and gate oxide leakage current in the direct tunneling regime Loh, W.Y. Cho, B.J. Li, M.F. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1492011 Applied Physics Letters 81 2 379-381 APPLA 2014-06-17T02:43:16Z 2014-06-17T02:43:16Z 2002-07-08 Article Loh, W.Y., Cho, B.J., Li, M.F. (2002-07-08). Correlation between interface traps and gate oxide leakage current in the direct tunneling regime. Applied Physics Letters 81 (2) : 379-381. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1492011 00036951 http://scholarbank.nus.edu.sg/handle/10635/55453 000176487400065 Scopus |
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10.1063/1.1492011 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Loh, W.Y. Cho, B.J. Li, M.F. |
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Loh, W.Y. Cho, B.J. Li, M.F. |
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Loh, W.Y. Cho, B.J. Li, M.F. Correlation between interface traps and gate oxide leakage current in the direct tunneling regime |
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Loh, W.Y. |
title |
Correlation between interface traps and gate oxide leakage current in the direct tunneling regime |
title_short |
Correlation between interface traps and gate oxide leakage current in the direct tunneling regime |
title_full |
Correlation between interface traps and gate oxide leakage current in the direct tunneling regime |
title_fullStr |
Correlation between interface traps and gate oxide leakage current in the direct tunneling regime |
title_full_unstemmed |
Correlation between interface traps and gate oxide leakage current in the direct tunneling regime |
title_sort |
correlation between interface traps and gate oxide leakage current in the direct tunneling regime |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/55453 |
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