Correlation between interface traps and gate oxide leakage current in the direct tunneling regime

10.1063/1.1492011

Saved in:
Bibliographic Details
Main Authors: Loh, W.Y., Cho, B.J., Li, M.F.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55453
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Be the first to leave a comment!
You must be logged in first