Critical dimension uniformity via real-time photoresist thickness control

10.1109/TSM.2007.907610

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Bibliographic Details
Main Authors:	Ho, W.K., Tay, A., Chen, M., Fu, J., Lu, H., Shan, X.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/55472
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Institution:	National University of Singapore

Description
Summary:	10.1109/TSM.2007.907610

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