Critical dimension uniformity via real-time photoresist thickness control
10.1109/TSM.2007.907610
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2014
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sg-nus-scholar.10635-554722023-10-25T23:12:46Z Critical dimension uniformity via real-time photoresist thickness control Ho, W.K. Tay, A. Chen, M. Fu, J. Lu, H. Shan, X. ELECTRICAL & COMPUTER ENGINEERING 10.1109/TSM.2007.907610 IEEE Transactions on Semiconductor Manufacturing 20 4 376-380 ITSME 2014-06-17T02:43:28Z 2014-06-17T02:43:28Z 2007-11 Article Ho, W.K., Tay, A., Chen, M., Fu, J., Lu, H., Shan, X. (2007-11). Critical dimension uniformity via real-time photoresist thickness control. IEEE Transactions on Semiconductor Manufacturing 20 (4) : 376-380. ScholarBank@NUS Repository. https://doi.org/10.1109/TSM.2007.907610 08946507 http://scholarbank.nus.edu.sg/handle/10635/55472 000250929200005 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| description |
10.1109/TSM.2007.907610 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Ho, W.K. Tay, A. Chen, M. Fu, J. Lu, H. Shan, X. |
| format |
Article |
| author |
Ho, W.K. Tay, A. Chen, M. Fu, J. Lu, H. Shan, X. |
| spellingShingle |
Ho, W.K. Tay, A. Chen, M. Fu, J. Lu, H. Shan, X. Critical dimension uniformity via real-time photoresist thickness control |
| author_sort |
Ho, W.K. |
| title |
Critical dimension uniformity via real-time photoresist thickness control |
| title_short |
Critical dimension uniformity via real-time photoresist thickness control |
| title_full |
Critical dimension uniformity via real-time photoresist thickness control |
| title_fullStr |
Critical dimension uniformity via real-time photoresist thickness control |
| title_full_unstemmed |
Critical dimension uniformity via real-time photoresist thickness control |
| title_sort |
critical dimension uniformity via real-time photoresist thickness control |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/55472 |
| _version_ |
1781412134603718656 |