High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing

10.1063/1.2267663

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Bibliographic Details
Main Authors:	Wang, G.H., Toh, E.-H., Foo, Y.-L., Tung, C.-H., Choy, S.-F., Samudra, G., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/56193
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-56193
record_format	dspace
spelling	sg-nus-scholar.10635-561932024-11-09T07:32:20Z High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing Wang, G.H. Toh, E.-H. Foo, Y.-L. Tung, C.-H. Choy, S.-F. Samudra, G. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2267663 Applied Physics Letters 89 5 - APPLA 2014-06-17T02:51:48Z 2014-06-17T02:51:48Z 2006 Article Wang, G.H., Toh, E.-H., Foo, Y.-L., Tung, C.-H., Choy, S.-F., Samudra, G., Yeo, Y.-C. (2006). High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing. Applied Physics Letters 89 (5) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2267663 00036951 http://scholarbank.nus.edu.sg/handle/10635/56193 000239520200081 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.2267663
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wang, G.H. Toh, E.-H. Foo, Y.-L. Tung, C.-H. Choy, S.-F. Samudra, G. Yeo, Y.-C.
format	Article
author	Wang, G.H. Toh, E.-H. Foo, Y.-L. Tung, C.-H. Choy, S.-F. Samudra, G. Yeo, Y.-C.
spellingShingle	Wang, G.H. Toh, E.-H. Foo, Y.-L. Tung, C.-H. Choy, S.-F. Samudra, G. Yeo, Y.-C. High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing
author_sort	Wang, G.H.
title	High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing
title_short	High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing
title_full	High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing
title_fullStr	High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing
title_full_unstemmed	High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing
title_sort	high quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/56193
_version_	1821199236028432384

High quality silicon-germanium-on-insulator wafers fabricated using cyclical thermal oxidation and annealing

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