Impact of buried capping layer on electrical stablity of advanced interconnects
10.1116/1.1978895
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sg-nus-scholar.10635-562612023-10-25T07:24:36Z Impact of buried capping layer on electrical stablity of advanced interconnects Yiang, K.Y. Yoo, W.J. Krishnamoorthy, A. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.1978895 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 23 4 1499-1503 JVTBD 2014-06-17T02:52:35Z 2014-06-17T02:52:35Z 2005 Article Yiang, K.Y., Yoo, W.J., Krishnamoorthy, A. (2005). Impact of buried capping layer on electrical stablity of advanced interconnects. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 23 (4) : 1499-1503. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1978895 10711023 http://scholarbank.nus.edu.sg/handle/10635/56261 000231211500028 Scopus |
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Asia |
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Singapore Singapore |
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ScholarBank@NUS |
| description |
10.1116/1.1978895 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Yiang, K.Y. Yoo, W.J. Krishnamoorthy, A. |
| format |
Article |
| author |
Yiang, K.Y. Yoo, W.J. Krishnamoorthy, A. |
| spellingShingle |
Yiang, K.Y. Yoo, W.J. Krishnamoorthy, A. Impact of buried capping layer on electrical stablity of advanced interconnects |
| author_sort |
Yiang, K.Y. |
| title |
Impact of buried capping layer on electrical stablity of advanced interconnects |
| title_short |
Impact of buried capping layer on electrical stablity of advanced interconnects |
| title_full |
Impact of buried capping layer on electrical stablity of advanced interconnects |
| title_fullStr |
Impact of buried capping layer on electrical stablity of advanced interconnects |
| title_full_unstemmed |
Impact of buried capping layer on electrical stablity of advanced interconnects |
| title_sort |
impact of buried capping layer on electrical stablity of advanced interconnects |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/56261 |
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1781781139286917120 |