Impact of buried capping layer on electrical stablity of advanced interconnects
10.1116/1.1978895
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Main Authors: | Yiang, K.Y., Yoo, W.J., Krishnamoorthy, A. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/56261 |
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Institution: | National University of Singapore |
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