Large-area parallel near-field optical nanopatterning of functional materials using microsphere mask

Large-area parallel near-field optical nanopatterning of functional materials using microsphere mask

10.1016/j.jallcom.2006.02.112

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Bibliographic Details
Main Authors: Chen, G.X., Hong, M.H., Lin, Y., Wang, Z.B., Ng, D.K.T., Xie, Q., Tan, L.S., Chong, T.C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Laser processing
Microspheres
Nanopatterning
Near-field effects
Scanning electron microscopy
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56456
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Institution: National University of Singapore

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