On control of resist film uniformity in the microlithography process
10.1016/j.conengprac.2003.12.001
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sg-nus-scholar.10635-568582023-10-31T07:47:41Z On control of resist film uniformity in the microlithography process Ho, W.K. Tay, A. Lee, L.L. Schaper, C.D. ELECTRICAL & COMPUTER ENGINEERING Generalized predictive control Photoresist processing Semiconductor manufacturing Temperature control 10.1016/j.conengprac.2003.12.001 Control Engineering Practice 12 7 881-892 COEPE 2014-06-17T02:59:27Z 2014-06-17T02:59:27Z 2004-07 Article Ho, W.K., Tay, A., Lee, L.L., Schaper, C.D. (2004-07). On control of resist film uniformity in the microlithography process. Control Engineering Practice 12 (7) : 881-892. ScholarBank@NUS Repository. https://doi.org/10.1016/j.conengprac.2003.12.001 09670661 http://scholarbank.nus.edu.sg/handle/10635/56858 000221433000010 Scopus |
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Generalized predictive control Photoresist processing Semiconductor manufacturing Temperature control |
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Generalized predictive control Photoresist processing Semiconductor manufacturing Temperature control Ho, W.K. Tay, A. Lee, L.L. Schaper, C.D. On control of resist film uniformity in the microlithography process |
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10.1016/j.conengprac.2003.12.001 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Ho, W.K. Tay, A. Lee, L.L. Schaper, C.D. |
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Article |
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Ho, W.K. Tay, A. Lee, L.L. Schaper, C.D. |
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Ho, W.K. |
title |
On control of resist film uniformity in the microlithography process |
title_short |
On control of resist film uniformity in the microlithography process |
title_full |
On control of resist film uniformity in the microlithography process |
title_fullStr |
On control of resist film uniformity in the microlithography process |
title_full_unstemmed |
On control of resist film uniformity in the microlithography process |
title_sort |
on control of resist film uniformity in the microlithography process |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/56858 |
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1781781294217166848 |