On control of resist film uniformity in the microlithography process

10.1016/j.conengprac.2003.12.001

Saved in:
Bibliographic Details
Main Authors: Ho, W.K., Tay, A., Lee, L.L., Schaper, C.D.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56858
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-56858
record_format dspace
spelling sg-nus-scholar.10635-568582023-10-31T07:47:41Z On control of resist film uniformity in the microlithography process Ho, W.K. Tay, A. Lee, L.L. Schaper, C.D. ELECTRICAL & COMPUTER ENGINEERING Generalized predictive control Photoresist processing Semiconductor manufacturing Temperature control 10.1016/j.conengprac.2003.12.001 Control Engineering Practice 12 7 881-892 COEPE 2014-06-17T02:59:27Z 2014-06-17T02:59:27Z 2004-07 Article Ho, W.K., Tay, A., Lee, L.L., Schaper, C.D. (2004-07). On control of resist film uniformity in the microlithography process. Control Engineering Practice 12 (7) : 881-892. ScholarBank@NUS Repository. https://doi.org/10.1016/j.conengprac.2003.12.001 09670661 http://scholarbank.nus.edu.sg/handle/10635/56858 000221433000010 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Generalized predictive control
Photoresist processing
Semiconductor manufacturing
Temperature control
spellingShingle Generalized predictive control
Photoresist processing
Semiconductor manufacturing
Temperature control
Ho, W.K.
Tay, A.
Lee, L.L.
Schaper, C.D.
On control of resist film uniformity in the microlithography process
description 10.1016/j.conengprac.2003.12.001
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Ho, W.K.
Tay, A.
Lee, L.L.
Schaper, C.D.
format Article
author Ho, W.K.
Tay, A.
Lee, L.L.
Schaper, C.D.
author_sort Ho, W.K.
title On control of resist film uniformity in the microlithography process
title_short On control of resist film uniformity in the microlithography process
title_full On control of resist film uniformity in the microlithography process
title_fullStr On control of resist film uniformity in the microlithography process
title_full_unstemmed On control of resist film uniformity in the microlithography process
title_sort on control of resist film uniformity in the microlithography process
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/56858
_version_ 1781781294217166848