Resist film uniformity in the microlithography process

10.1109/TSM.2002.801380

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Bibliographic Details
Main Authors:	Ho, W.K., Lee, L.L., Tay, A., Schaper, C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/57255
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Institution:	National University of Singapore

Description
Summary:	10.1109/TSM.2002.801380

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