Resist film uniformity in the microlithography process
10.1109/TSM.2002.801380
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sg-nus-scholar.10635-572552023-10-30T21:49:49Z Resist film uniformity in the microlithography process Ho, W.K. Lee, L.L. Tay, A. Schaper, C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/TSM.2002.801380 IEEE Transactions on Semiconductor Manufacturing 15 3 323-330 ITSME 2014-06-17T03:04:05Z 2014-06-17T03:04:05Z 2002-08 Article Ho, W.K., Lee, L.L., Tay, A., Schaper, C. (2002-08). Resist film uniformity in the microlithography process. IEEE Transactions on Semiconductor Manufacturing 15 (3) : 323-330. ScholarBank@NUS Repository. https://doi.org/10.1109/TSM.2002.801380 08946507 http://scholarbank.nus.edu.sg/handle/10635/57255 000177372200003 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| description |
10.1109/TSM.2002.801380 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Ho, W.K. Lee, L.L. Tay, A. Schaper, C. |
| format |
Article |
| author |
Ho, W.K. Lee, L.L. Tay, A. Schaper, C. |
| spellingShingle |
Ho, W.K. Lee, L.L. Tay, A. Schaper, C. Resist film uniformity in the microlithography process |
| author_sort |
Ho, W.K. |
| title |
Resist film uniformity in the microlithography process |
| title_short |
Resist film uniformity in the microlithography process |
| title_full |
Resist film uniformity in the microlithography process |
| title_fullStr |
Resist film uniformity in the microlithography process |
| title_full_unstemmed |
Resist film uniformity in the microlithography process |
| title_sort |
resist film uniformity in the microlithography process |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/57255 |
| _version_ |
1781781373518872576 |