SILICON NITRIDE FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION (PECVD) OF SiH//4/NH//3/N//2 MIXTURES: SOME PHYSICAL PROPERTIES.

• Main Authors: Ling, C.H., Kwok, C.Y., Prasad, K.
• Other Authors: ELECTRICAL ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/62763
• Institution: National University of Singapore

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes