SILICON NITRIDE FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION (PECVD) OF SiH//4/NH//3/N//2 MIXTURES: SOME PHYSICAL PROPERTIES.
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
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Main Authors: | Ling, C.H., Kwok, C.Y., Prasad, K. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/62763 |
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Institution: | National University of Singapore |
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